DocumentCode :
3561494
Title :
Semiconductors: Toeing the (microfine) line: Functional density is what counts in advanced solid-state devices. Here´s a report on recent progress
Author :
Allan, R.
Volume :
14
Issue :
12
fYear :
1977
Firstpage :
34
Lastpage :
42
Abstract :
Reports on recent progress in the increase of LSI IC functional densities. Discusses photolithographic and electron beam methods.
Keywords :
electron beam applications; integrated circuit technology; large scale integration; photolithography; electron beam methods; photolithographic methods; semiconductor functional densities;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/MSPEC.1977.6501718
Filename :
6501718
Link To Document :
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