• DocumentCode
    3561494
  • Title

    Semiconductors: Toeing the (microfine) line: Functional density is what counts in advanced solid-state devices. Here´s a report on recent progress

  • Author

    Allan, R.

  • Volume
    14
  • Issue
    12
  • fYear
    1977
  • Firstpage
    34
  • Lastpage
    42
  • Abstract
    Reports on recent progress in the increase of LSI IC functional densities. Discusses photolithographic and electron beam methods.
  • Keywords
    electron beam applications; integrated circuit technology; large scale integration; photolithography; electron beam methods; photolithographic methods; semiconductor functional densities;
  • fLanguage
    English
  • Journal_Title
    Spectrum, IEEE
  • Publisher
    ieee
  • ISSN
    0018-9235
  • Type

    jour

  • DOI
    10.1109/MSPEC.1977.6501718
  • Filename
    6501718