Title :
Plasma properties of YBaCuO oxide films by rf facing targets magnetron sputtering
Author :
Choi, Chung-Seog ; Ebihara, Kenji ; Park, Bok-Kee ; Seong, Nak- Jin ; Kyung-Sup Lee ; Lee, Duck-Chool
Author_Institution :
Inha Univ., Inchon, South Korea
Abstract :
The optical emission of the rf facing targets magnetron sputtering (rf FTMS) plasma was analyzed to elucidate the sputtering process and the gas phase reaction. It is shown that oxygen content affects the amount of sputtered species. The resulting optimum conditions were found to be an rf power of 50 W, substrate position of 20 mm, total gas pressure of 60 mTorr, oxygen mixture ratio of 40%, and substrate temperature of 650°C
Keywords :
atomic emission spectroscopy; barium compounds; high-temperature superconductors; plasma diagnostics; sputter deposition; superconducting thin films; yttrium compounds; 20 mm; 50 W; 60 mtorr; 650 C; O content; O2 mixture ratio; O2-Ar; YBaCuO; YBaCuO films; gas phase reaction; optical emission; optimum conditions; plasma properties; rf facing targets magnetron sputtering; rf power; sputtering process; substrate position; substrate temperature; total gas pressure; Plasma measurements; Plasma properties; Plasma temperature; Radio frequency; Sputtering; Stimulated emission; Substrates; Superconducting magnets; Temperature measurement; Yttrium barium copper oxide;
Conference_Titel :
Properties and Applications of Dielectric Materials, 1997., Proceedings of the 5th International Conference on
Print_ISBN :
0-7803-2651-2
DOI :
10.1109/ICPADM.1997.617669
