Title :
Depletion mechanisms in STED-inspired lithography
Author :
Fischer, J. ; Wolf, T.J.A. ; Unterreiner, A.-N. ; Wegener, M.
Author_Institution :
Inst. fur Angewandte Phys., Karlsruhe Inst. of Technol. (KIT), Karlsruhe, Germany
Abstract :
Direct laser writing optical lithography using light-induced depletion allows for fabricating structures beyond the diffraction limit. We investigate the depletion mechanisms of the photoinitiator DETC aiming at optimizing future photoresists.
Keywords :
laser materials processing; light diffraction; optical fabrication; photolithography; photoresists; stimulated emission; STED-inspired lithography; direct laser writing optical lithography; light-induced depletion; photoinitiator DETC; photoresists; Diffraction; Laser excitation; Lithography; Resists; Sensitivity; Stimulated emission;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Print_ISBN :
978-1-4673-1839-6
