Title :
Fabrication of silica-on-Si waveguide with higher index difference and its application to 256 channel arrayed waveguide multi/demultiplexer
Author :
Hibino, Y. ; Hida, Y. ; Kaneko, A. ; Ishii, M. ; Itoh, M. ; Goh, T. ; Sugita, A. ; Saida, T. ; Himeno, A. ; Ohmori, Y.
Author_Institution :
NTT Photonics Labs., Tokai, Japan
Abstract :
Improved techniques were used to fabricate a silica-on-Si waveguide with a higher core-to-cladding index difference and a 2 mm bending radius. A 256 channel and 25 GHz spacing arrayed-waveguide multiplexer with low loss and low crosstalk was successfully fabricated for the first time using the waveguides.
Keywords :
demultiplexing equipment; multiplexing equipment; optical communication equipment; optical crosstalk; optical fabrication; optical losses; optical planar waveguides; refractive index; silicon compounds; wavelength division multiplexing; SiO/sub 2/-Si; WDM; arrayed-waveguide demultiplexer; arrayed-waveguide multiplexer; bending radius; core-to-cladding index difference; low crosstalk; low loss fibre connection; planar lightwave circuit devices; silica-on-Si waveguide; waveguide fabrication; Arrayed waveguide gratings; Circuits; Laboratories; Optical device fabrication; Optical fiber devices; Optical fibers; Optical waveguides; Photonics; Programmable control; Silicon compounds;
Conference_Titel :
Optical Fiber Communication Conference, 2000
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-630-3
DOI :
10.1109/OFC.2000.868261
