DocumentCode
3564426
Title
3D SiC/Si normally-off MOSFET for high power high speed applications
Author
Veesam, Vamshi ; Thakkallapally, Ramana ; Abdel-Motaleb, Ibrahim ; Zheng Shen
Author_Institution
Dept. of Electr. Eng., Northern Illinois Univ., DeKalb, IL, USA
fYear
2014
Firstpage
17
Lastpage
20
Abstract
An optimized power system requires the integration of more than one technology. In this paper we present a 3D 3C-SiC/Si MOSFET, where high performance power devices can be integrated with low cost Si technology. Using the numerical analysis simulator Silvaco Atlas to simulate the device performance, it was found that these devices can provide double the current while occupying less than 33% of the substrate area of a lateral device with the same gate length and width. The device simulation shows that the breakdown voltage can reach 265V and the drain current can reach 0.5 A/mm at Vg =4 V. The stability of this device with temperature makes it an excellent candidate for high power applications.
Keywords
MOSFET; high-speed integrated circuits; numerical analysis; silicon compounds; three-dimensional integrated circuits; wide band gap semiconductors; 3D high normally-off MOSFET; SiC-Si; breakdown voltage; drain current; gate length; gate width; high performance power devices; high power high speed applications; lateral device; low cost technology; numerical analysis simulator silvaco atlas; power system optimization; substrate area; Logic gates; MOSFET; Metals; Silicon; Silicon carbide; Substrates; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Aerospace and Electronics Conference, NAECON 2014 - IEEE National
Print_ISBN
978-1-4799-4690-7
Type
conf
DOI
10.1109/NAECON.2014.7045767
Filename
7045767
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