DocumentCode :
35649
Title :
Figure of Merit for Optimization of Metal–Dielectric Multilayer Lenses
Author :
Dongdong Li ; Dao Hua Zhang ; Changchun Yan ; Zhengji Xu
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Volume :
13
Issue :
3
fYear :
2014
fDate :
May-14
Firstpage :
452
Lastpage :
457
Abstract :
We propose a figure of merit (FoM) to optimize the multilayered metal-dielectric (MD) structure for subwavelength imaging. The proposed FoM accounts both the waveguiding and transmission properties of the multilayered MD structure. We numerically demonstrate that the FoM can be used to find the optimized geometry parameters, as well as the optimized working wavelength. Such a FoM can act as an efficient tool for design and fabrication of the multilayered MD lenses.
Keywords :
dielectric materials; geometrical optics; lenses; light transmission; numerical analysis; optical fabrication; optical images; optical multilayers; optical waveguides; optimisation; figure of merit; geometry parameter optimization; metal-dielectric multilayer lens design; metal-dielectric multilayer lens fabrication; subwavelength imaging; transmission properties; waveguiding properties; Anisotropic magnetoresistance; Dispersion; Filling; Imaging; Lenses; Permittivity; Slabs; Figure of merit (FoM); metal–dielectric (MD); multilayered; subwavelength imaging;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2013.2295620
Filename :
6690224
Link To Document :
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