• DocumentCode
    3565043
  • Title

    High sensitivity image sensor overlaid with thin-film crystalline-selenium-based heterojunction photodiode

  • Author

    Imura, S. ; Kikuchi, K. ; Miyakawa, K. ; Ohtake, H. ; Kubota, M. ; Nakada, T. ; Okino, T. ; Hirose, Y. ; Kato, Y. ; Teranishi, N.

  • Author_Institution
    NHK Sci. & Technol. Res. Labs., Tokyo, Japan
  • fYear
    2014
  • Abstract
    We have developed a stacked image sensor based on a thin-film crystalline selenium (c-Se) heterojunction photodiode. Uniform c-Se-based photodiodes laminated on complementary metal-oxide-semiconductor circuits were fabricated by tellurium-diffused crystallization. We herein present the first high-resolution images obtained with such a device. Furthermore, the dark current was significantly decreased by using an n-type wide-band-gap gallium oxide (Ga2O3) layer with a high hole-injection barrier.
  • Keywords
    CMOS integrated circuits; gallium compounds; image resolution; image sensors; photodiodes; thin film circuits; wide band gap semiconductors; Ga2O3; complementary metal-oxide-semiconductor circuits; dark current; high-resolution images; hole-injection barrier; image sensor; tellurium-diffused crystallization; thin-film crystalline selenium heterojunction photodiode; wide-band-gap gallium oxide layer; CMOS integrated circuits; Dark current; Electrodes; Films; Image sensors; Photodiodes; Sensitivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2014 IEEE International
  • Type

    conf

  • DOI
    10.1109/IEDM.2014.7046981
  • Filename
    7046981