DocumentCode :
3565043
Title :
High sensitivity image sensor overlaid with thin-film crystalline-selenium-based heterojunction photodiode
Author :
Imura, S. ; Kikuchi, K. ; Miyakawa, K. ; Ohtake, H. ; Kubota, M. ; Nakada, T. ; Okino, T. ; Hirose, Y. ; Kato, Y. ; Teranishi, N.
Author_Institution :
NHK Sci. & Technol. Res. Labs., Tokyo, Japan
fYear :
2014
Abstract :
We have developed a stacked image sensor based on a thin-film crystalline selenium (c-Se) heterojunction photodiode. Uniform c-Se-based photodiodes laminated on complementary metal-oxide-semiconductor circuits were fabricated by tellurium-diffused crystallization. We herein present the first high-resolution images obtained with such a device. Furthermore, the dark current was significantly decreased by using an n-type wide-band-gap gallium oxide (Ga2O3) layer with a high hole-injection barrier.
Keywords :
CMOS integrated circuits; gallium compounds; image resolution; image sensors; photodiodes; thin film circuits; wide band gap semiconductors; Ga2O3; complementary metal-oxide-semiconductor circuits; dark current; high-resolution images; hole-injection barrier; image sensor; tellurium-diffused crystallization; thin-film crystalline selenium heterojunction photodiode; wide-band-gap gallium oxide layer; CMOS integrated circuits; Dark current; Electrodes; Films; Image sensors; Photodiodes; Sensitivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2014 IEEE International
Type :
conf
DOI :
10.1109/IEDM.2014.7046981
Filename :
7046981
Link To Document :
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