DocumentCode :
3565838
Title :
High density routing with electrical performance analysis using fine line package structure
Author :
Cheng-Hsun Lin ; Tsun-Lung Hsieh ; Chili-Yi Huang ; Hung-Hsiang Cheng ; Chen-Chao Wang
Author_Institution :
Electr. Lab., Adv. Semicond. Eng., Inc., Kaohsiung, Taiwan
fYear :
2014
Firstpage :
181
Lastpage :
184
Abstract :
In this paper, the package solutions for die-to-die interconnection including fine-line substrate and ASE advance wafer level package (aWLP) have been purposed. The fin-line substrate has 3um trace width and 3um trace space on top layer with copper interconnection. For aWLP, the trace width and space of interconnection on redistribution layer (RDL) is the same with fine-line substrate. The different materials of RDL runner have also been evaluated in this paper. For these two package types, the electrical performance is presented through six experiments. Electrical evaluations are compared through S-parameter model and R/L/C values on different design situations. Besides, the variation of impedance is also showed in this study.
Keywords :
copper; integrated circuit interconnections; wafer level packaging; ASE advance wafer level package; Cu; RDL; aWLP; copper interconnection; die-to-die interconnection; electrical performance analysis; fine line package structure; fine line substrate; high density routing; redistribution layer; Capacitance; Copper; Impedance; Resistance; Scattering parameters; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2014 9th International
Type :
conf
DOI :
10.1109/IMPACT.2014.7048399
Filename :
7048399
Link To Document :
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