Title :
Fabrication of Optically Transparent PDMS Artificial Lotus Leaf Film Using Underexposed and Underbaked Photoresist Mold
Author :
Youngsam Yoon ; Dong-weon Lee ; Jeong-Bong Lee
Author_Institution :
Dept. of Electr. Eng., Univ. of Texas at Dallas, Richardson, TX, USA
Abstract :
We report an extremely simple method of making an optically transparent superhydrophobic polydimethyl-siloxane (PDMS) thin film using underexposed and underbaked positive photoresist (PR) mold. Significant under soft-bake condition makes PR retain good amount of solvents, which greatly increases the dissolution rate of the PR during developing. A combination of optimal underbaking and underexposure condition created a unique hierarchical micro-/nano- structure on the PR mold, and inverse image of the PR mold was replicated to create a hierarchical micro/nano structured broccoli-shaped PDMS thin film. A 100-nm-thick fluorocarbon film was optionally deposited on the broccoli-shaped PDMS film to further enhance superhydrophobicity. Advancing and receding angles of the film for 4- μL water droplet were found to be 161.33±0.763° and 133.33±0.29°, respectively, showing superhydrophobicity. It was also found that the optical transmittance at around 550 nm for this PDMS film was approximately 90%.
Keywords :
hydrophobicity; microfabrication; moulding; nanofabrication; nanolithography; photoresists; polymers; artificial lotus leaf film; broccoli shaped PDMS thin film; fluorocarbon film; hierarchical microstructure; hierarchical nanostructure; optically transparent PDMS fabrication; optimal underbaking; size 100 nm; soft bake condition; superhydrophobic polydimethyl siloxane thin film; underbaked photoresist mold; underexposed photoresist mold; underexposure condition; PDMS; superhydrophobicity; underbaking; underexposure;
Journal_Title :
Microelectromechanical Systems, Journal of
DOI :
10.1109/JMEMS.2013.2264729