• DocumentCode
    3569487
  • Title

    Defect Detection Rate through IDDQ for Production Testing

  • Author

    Hirase, Junichi

  • Author_Institution
    Japan Sci. & Technol. Agency
  • fYear
    2008
  • Firstpage
    199
  • Lastpage
    205
  • Abstract
    With the miniaturization of the diffusion process, the leak current per transistor tends to increase and the number of transistors per die tends to become larger, thus rendering more difficult the discrimination through the absolute value of IDDQ (quiescent power supply current) that is required to detect defects on VLSI (Very Large Scale Integration). While various statistical methods have been disclosed, this paper describes first the effects of an increase in the average value of IDDQ due to process dispersion on the IDDQ distribution and presents a theorization to estimate the defect detection rate of various IDDQ testing methods. Corroborative results will then show the validity of the presented theory on the defect detection rate of IDDQ.
  • Keywords
    VLSI; design for testability; diffusion; flaw detection; integrated circuit design; integrated circuit testing; production testing; IDDQ testing; VLSI; defect detection rate; design-for-testability; diffusion process; process dispersion; production testing; quiescent power supply current; very large scale integration; Current supplies; Diffusion processes; Dispersion; Estimation theory; Leak detection; Power supplies; Production; Statistical analysis; Testing; Very large scale integration; Defect detection rate; Exponential distribution; Gamma distribution; IDDQ; Performance index; Product of average defective current;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Asian Test Symposium, 2008. ATS '08. 17th
  • ISSN
    1081-7735
  • Print_ISBN
    978-0-7695-3396-4
  • Type

    conf

  • DOI
    10.1109/ATS.2008.88
  • Filename
    4711584