DocumentCode
3569512
Title
How To Increase the Effectiveness of Yield Diagnostics-Is DFM the Answer to This?
Author
Uzzaman, Anis
Author_Institution
Cadence Design Syst. Inc., San Jose, CA
fYear
2008
Firstpage
221
Lastpage
221
Abstract
The goal of this panel is to discuss some of the following important items: (i) Are conventional yield diagnostics systems good enough at smaller geometries to isolate the defective location on the chip with good accuracy? (ii) Can DFM based hotspots be overlaid with the yield diagnostics callout based X-Y location and accuracy can be achieved for physical failure analysis? (iii) Can yield diagnostics systems provide a critical link back into the design process for improving design for manufacturability (DFM)?
Keywords
design for manufacture; nanotechnology; advanced nanometer process technology; design for manufacturability; parametric variations; products; systematic marginalities; yield diagnostics; yield learning technique; Circuit faults; Circuit testing; Circuit topology; Design for manufacture; Failure analysis; Geometry; Manufacturing processes; Nanoscale devices; Process design; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Asian Test Symposium, 2008. ATS '08. 17th
ISSN
1081-7735
Print_ISBN
978-0-7695-3396-4
Type
conf
DOI
10.1109/ATS.2008.95
Filename
4711587
Link To Document