• DocumentCode
    35718
  • Title

    Micro-Plasma Field Effect Transistor Operating With DC Plasma

  • Author

    Pai, Pradeep ; Tabib-Azar, Massood

  • Author_Institution
    Electr. & Comput. Eng. Dept., Univ. of Utah, Salt Lake City, UT, USA
  • Volume
    35
  • Issue
    5
  • fYear
    2014
  • fDate
    May-14
  • Firstpage
    593
  • Lastpage
    595
  • Abstract
    This letter presents the smallest microplasma field effect transistor (MOPFET) reported to date. The MOPFET has a gaseous (atmospheric pressure He) channel and operates in the sub-Paschen breakdown regime, where the channel breakdown voltage depends (nearly) linearly on the channel length. The gate field effect is explained by noting that the channel ionization depends on the primary electron density that is controlled by both VDS and VG; negative VG increased the channel electron density lowering the channel breakdown voltage (VDS-B), whereas positive VG attracted the channel electrons and reduced their density for ionization in the channel increasing the VDS-B. A simple empirical model using Townsend breakdown criteria is developed to include the effect of the gate electric field in VDS-B.
  • Keywords
    atmospheric pressure; electric breakdown; electron density; field effect transistors; ionisation; plasma applications; He; MOPFET; Townsend breakdown criteria; atmospheric pressure; channel breakdown voltage; channel electron density; channel ionization; channel length; dc plasma; empirical model; gaseous channel; gate electric field; gate field effect; microplasma field effect transistor; primary electron density; sub-Paschen breakdown regime; Cathodes; Electric breakdown; Logic gates; Plasmas; Sputtering; Transistors; Atmospheric-pressure plasmas; glow discharge devices; plasma devices; plasma devices.;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2014.2308155
  • Filename
    6767081