DocumentCode
35718
Title
Micro-Plasma Field Effect Transistor Operating With DC Plasma
Author
Pai, Pradeep ; Tabib-Azar, Massood
Author_Institution
Electr. & Comput. Eng. Dept., Univ. of Utah, Salt Lake City, UT, USA
Volume
35
Issue
5
fYear
2014
fDate
May-14
Firstpage
593
Lastpage
595
Abstract
This letter presents the smallest microplasma field effect transistor (MOPFET) reported to date. The MOPFET has a gaseous (atmospheric pressure He) channel and operates in the sub-Paschen breakdown regime, where the channel breakdown voltage depends (nearly) linearly on the channel length. The gate field effect is explained by noting that the channel ionization depends on the primary electron density that is controlled by both VDS and VG; negative VG increased the channel electron density lowering the channel breakdown voltage (VDS-B), whereas positive VG attracted the channel electrons and reduced their density for ionization in the channel increasing the VDS-B. A simple empirical model using Townsend breakdown criteria is developed to include the effect of the gate electric field in VDS-B.
Keywords
atmospheric pressure; electric breakdown; electron density; field effect transistors; ionisation; plasma applications; He; MOPFET; Townsend breakdown criteria; atmospheric pressure; channel breakdown voltage; channel electron density; channel ionization; channel length; dc plasma; empirical model; gaseous channel; gate electric field; gate field effect; microplasma field effect transistor; primary electron density; sub-Paschen breakdown regime; Cathodes; Electric breakdown; Logic gates; Plasmas; Sputtering; Transistors; Atmospheric-pressure plasmas; glow discharge devices; plasma devices; plasma devices.;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2014.2308155
Filename
6767081
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