• DocumentCode
    3571911
  • Title

    Fabricating novel diamond waveguides using the focused ion beam hard mask

  • Author

    McKenzie, W. ; Hiscocks, M. ; Ladouceur, F.

  • Author_Institution
    Electron Microscope Unit, Univ. of New South Wales, Sydney, NSW, Australia
  • fYear
    2010
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The Focused ion beam has been used to direct write a hard mask against the plasma etching of diamond. Nano-waveguides were fabricated from diamond-on-silica thin films close to ideal dimensions predicted via FIMMWAVE simulations.
  • Keywords
    diamond; focused ion beam technology; integrated optics; masks; nanophotonics; optical fabrication; optical films; optical waveguides; sputter etching; thin films; C-SiO2; FIMMWAVE simulations; SiO2; diamond waveguide fabrication; diamond-on-silica thin films; direct writing; focused ion beam hard mask; nanowaveguides; plasma etching; Diamond-like carbon; Etching; Ion beams; Optical waveguides; Plasmas; FIB; diamond; hard mask; slot-waveguide; waveguide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fibre Technology (ACOFT), 2010 35th Australian Conference on
  • Type

    conf

  • DOI
    10.1109/ACOFT.2010.5929925
  • Filename
    5929925
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3571911