DocumentCode :
3572553
Title :
Synchronous control technology of nano-stage in lithographic equipment using for LED manufacturing
Author :
Liwei Wu ; Feng Chi ; Xiaofeng Yang
Author_Institution :
Sch. of Microelectron., Fudan Univ., Shanghai, China
fYear :
2014
Firstpage :
810
Lastpage :
815
Abstract :
A novel nano-stages system included wafer stage and reticle stage used for LED photolithography equipment with 0.8 micro technology node (half pitch) was proposed. A method of standstill dynamic error of synchronization control (SDSC) minimized the relative difference between motions of two stages. In order to improving the synchronization control error of two stages, reticle stage servo stiffness compensated against the synchronization error and wafer stage acceleration error fed forward on the reticle stage were described in the method. Through modeling and simulation, an optimization results were carried out to verify that SDSC method effectively minimized the relative location error. Finally, the advantages of the method were proved by prototype test data as a conclusion.
Keywords :
compensation; light emitting diodes; nanoelectronics; photolithography; synchronisation; wafer-scale integration; LED manufacturing; LED photolithography equipment; SDSC; micro technology node; nanostages system; reticle stage; servo stiffness compensation; standstill dynamic error of synchronization control; synchronization control error; synchronous control technology; wafer stage acceleration error; Dynamics; Educational institutions; Erbium; Light emitting diodes; Lithography; Mirrors; Synchronization; photolithography equipment; precision motion control; reticle stage; synchronous control; wafer stage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Intelligent Control and Automation (WCICA), 2014 11th World Congress on
Type :
conf
DOI :
10.1109/WCICA.2014.7052820
Filename :
7052820
Link To Document :
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