DocumentCode
3573356
Title
Investigation of a-Si:H Density of States by Photo Induced Discharge
Author
Mariucci, L. ; Carluccio, R. ; Massimiani, D. ; Fortunato, G.
Author_Institution
IESS-CNR, via Cineto Romano 42, 00156 ROMA, ITALY
fYear
1996
Firstpage
1051
Lastpage
1054
Abstract
Photo-Induced Discharge (PID) technique has been used in order to probe the density of states (DOS) in a-Si:H thin film transistors (TFTs). According to the experimental parameters used, a determination of the DOS in n-channel devices has been obtained with particular sensitivity to the near midgap DOS.
Keywords
Charge carrier processes; Charge measurement; Current measurement; Delay effects; Electron traps; Energy measurement; Pulse amplifiers; Pulse generation; Thin film transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Print_ISBN
286332196X
Type
conf
Filename
5435828
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