DocumentCode :
3573765
Title :
Influence of Mobility Degradation on Distortion Analysis in MOSFETs
Author :
van Langevelde, R. ; Klaassen, F.M.
Author_Institution :
Faculty of Electrical Engineering, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, the Netherlands
fYear :
1996
Firstpage :
667
Lastpage :
670
Abstract :
Compact MOSFET models in contemporary circuit-simulators fail to accurately describe distortion effects. In the linear region of the MOSFET this failure is mainly due to inaccurate modelling of the mobility degradation effect. In this paper a new model for mobility degradation is introduced which gives a major improvement in distortion analysis in the linear region for both n-type and p-type MOS-transistors. Incorporating a gate voltage dependent series-resistance, this model even gives good results for very short channel length devices.
Keywords :
Charge carrier processes; Degradation; Electron mobility; Failure analysis; MOSFETs; Particle scattering; Phonons; Predictive models; Rough surfaces; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
Print_ISBN :
286332196X
Type :
conf
Filename :
5436088
Link To Document :
بازگشت