Title :
Surface plasma CVD as a new technological platform for Er-doped waveguide amplifiers and lasers fabrication
Author :
Kholodkov, A.V. ; Golant, K.M.
Author_Institution :
Fiber Opt. Res. Center, Russian Acad. of Sci., Moscow, Russia
Abstract :
Microwave-induced plasma chemical deposition is used to synthesize Er-doped nonfused glassy films. Silicate hosts with various additives are investigated. A high quantum yield of C-band luminescence is obtained at Er/sup 3+/ concentrations up to /spl sim/3/spl times/10/sup 20/cm/sup -3/.
Keywords :
erbium; optical fabrication; optical films; optical glass; photoluminescence; plasma CVD; plasma production; solid lasers; waveguide lasers; 4 to 8 GHz; C-band luminescence; Er-doped nonfused glassy films; Er-doped waveguide amplifiers fabrication; Er-doped waveguide lasers fabrication; microwave-induced plasma chemical deposition; quantum yield; silicate hosts; surface plasma CVD;
Conference_Titel :
Optical Fiber Communication Conference, 2004. OFC 2004
Print_ISBN :
1-55752-772-5
