Title :
Investigation of the influence of duty cycle on the vanadium oxide thin film thermistor deposited by pulsed dc reactvie magnetron sputtering
Author :
Xiang Dong ; Zhiming Wu ; Xiangdong Xu ; Yu He ; Deen Gu ; Xiongbang Wei ; Tao Wang ; Yadong Jiang
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China (UESTC), Chengdu, China
Abstract :
Vanadium oxide (VOx) thin films were deposited using the pulsed dc reactive magnetron sputtering technique. The duty cycle of the pulsed power was found can be used to affect the reaction between the vanadium and oxygen and to tune the electrical properties of VOx. Depending on the influence of duty cycle on the composition, these VOx thin film thermistors showed room temperature resistivity in the range of 0.005 Ω-cm to 3.573 Ω-cm. The activation energy and thermistor constant are in the range of 0.016-0.188eV and 188-2182 K, respectively.
Keywords :
sputter deposition; thermistors; thin film resistors; vanadium compounds; VOx; duty cycle influence; electrical property; pulsed DC reactive magnetron sputtering deposition; temperature 293 K to 298 K; vanadium oxide thin film thermistor; Conductivity; Films; Sputtering; Temperature distribution; Temperature measurement; Thermistors; duty cycle; electrical property; thermistor; vanadium oxide;
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2014 IEEE International Conference on
DOI :
10.1109/EDSSC.2014.7061194
