DocumentCode :
3578164
Title :
Small signal modeling of 90 nm gate-length AlGaN/GaN HEMTs considering mesa edge effects
Author :
Jiangfeng Du ; Kang Wang ; Chenggong Yin ; Zhiyuan Bai ; Qi Yu ; Zhihong Feng ; Shaobo Dun
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
fYear :
2014
Firstpage :
1
Lastpage :
2
Abstract :
This paper proposes an improved small signal model (SSM) for 90 nm gate-length AlGaN/GaN HEMTs. A mesa edge effect capacitance (CMEE) is introduced into the small signal model to characterize the mesa edge effect. Using scaling formula, the value of CMEE is obtained as 5.1fF. This capacitance makes fT degeneration, especially in small gate-width (Wg) AlGaN/GaN HEMTs. After de-embedding CMEE from AlGaN/GaN HEMTs, the recalculated fT increases 33% with 2×20μm AlGaN/GaN HEMT. The results of our proposed SSM exhibit good agreement with the experimental data of AlGaN/GaN HEMTs with different Wg in our work.
Keywords :
III-V semiconductors; aluminium compounds; capacitance; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; AlGaN-GaN HEMT; SSM; capacitance 5.1 fF; deembedding; mesa edge effect capacitance; scaling formula; size 90 nm; small signal model; Aluminum gallium nitride; Fitting; Gallium nitride; Logic gates; AlGaN/GaN HEMTs; S parameters; mesa edge effect; modeling; small signal;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2014 IEEE International Conference on
Type :
conf
DOI :
10.1109/EDSSC.2014.7061240
Filename :
7061240
Link To Document :
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