Title :
Radiation effects on electrical treeing resistance and mechanical characteristics of low density polyethylene containing barbituric acid derivatives
Author :
Lee, C. ; Lim, K.J. ; Park, Y.G. ; Ryu, B.H. ; Kim, K.Y.
Author_Institution :
Chung-Buk Nat. Univ., Cheongju, South Korea
Abstract :
The treeing resistance of low density polyethylene containing barbituric acid derivatives under radiation environments were investigated. Barbituric acid, 4-aminouracil and 4-amino-6-hydroxy-2-mercapto pyrimidine were selected for treeing inhibitors. LDPE with the additives were irradiated by Co60 γ-rays. The treeing inception voltage and tree propagation was observed for electrical insulation properties, and the elongation at break was observed for the mechanical properties, to clarify the relation between the molecular structure and the electrical tree characteristics. Also thermoluminescence and gel contents were carried out at various dosages. LDPE containing treeing inhibitors showed better electrical insulation characteristics than pure LDPE. From the measurements, barbituric acid among the treeing inhibitors had the best treeing and radiation resistance
Keywords :
elongation; fracture; gamma-ray effects; insulation testing; organic compounds; polyethylene insulation; polymer structure; thermoluminescence; trees (electrical); 4-amino-6-hydroxy-2-mercapto pyrimidine; 4-aminouracil; Co60 γ-rays; LDPE; barbituric acid derivatives; breaking; electrical insulation; electrical treeing resistance; elongation; gel content; low density polyethylene; mechanical characteristics; molecular structure; radiation effects; thermoluminescence; tree propagation; treeing inception voltage; treeing inhibitors; treeing resistance; Additives; Dielectrics and electrical insulation; Electric resistance; Electrical resistance measurement; Inhibitors; Mechanical factors; Polyethylene; Radiation effects; Trees - insulation; Voltage;
Conference_Titel :
Properties and Applications of Dielectric Materials, 2000. Proceedings of the 6th International Conference on
Conference_Location :
Xi´an
Print_ISBN :
0-7803-5459-1
DOI :
10.1109/ICPADM.2000.875739
