DocumentCode
358279
Title
Electrical breakdown characteristics of electroformed copper electrodes in vacuum
Author
Kobayashi, S. ; Sekikawa, K. ; Shibusawa, M. ; Saito, Y. ; Tajiri, K. ; Kabeya, Z.
Author_Institution
Dept. of Electr. & Electron. Eng., Saitama Univ., Urawa, Japan
Volume
1
fYear
2000
fDate
2000
Firstpage
41
Abstract
The effects of copper deposits produced by three kinds of electroforming techniques on the breakdown characteristics in vacuum were compared. The electroforming was performed in (i) an acid sulfate bath with brighteners, (ii) a pyrophosphate bath, and (iii) an acid copper sulfate bath with periodic reverse electrolysis and electropolishing. Vacuum degassed oxygen-free copper was used as the substrate material. Electrical breakdown characteristics measured by repetitive breakdowns by applying impulse voltages revealed that the breakdown fields at the first application of voltage in vacuum were 13.4, 10.0, and 40.8 MV/m for the electrodes processed in the first, second and third baths, respectively. In addition an excellent conditioning effect was achieved without in situ electrode surface cleaning
Keywords
copper; electrodes; electroforming; electrolytic polishing; vacuum breakdown; Cu; acid copper sulfate bath; acid sulfate bath; breakdown characteristics; breakdown fields; brighteners; conditioning effect; copper deposits; electrical breakdown characteristics; electroformed copper electrodes; electropolishing; impulse voltages; periodic reverse electrolysis; pyrophosphate bath; repetitive breakdowns; substrate material; vacuum breakdown; vacuum degassed oxygen-free copper; Additives; Breakdown voltage; Conductivity; Copper; Electric breakdown; Electrodes; Impurities; Surface cleaning; Surface discharges; Vacuum breakdown;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
Conference_Location
Xi´an
Print_ISBN
0-7803-5791-4
Type
conf
DOI
10.1109/DEIV.2000.877247
Filename
877247
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