DocumentCode :
3589517
Title :
Carrier-mediated ferromagnetism in InGaGdN grown by plasma-assisted molecular beam epitaxy
Author :
Tawil, S.N.M. ; Zhou, Y.K. ; Krishnamurthy, D. ; Emura, S. ; Hasegawa, S. ; Asahi, H.
Author_Institution :
Inst. of Sci. & Ind. Res., Osaka Univ., Suita, Japan
fYear :
2011
Firstpage :
1
Lastpage :
4
Abstract :
InGaGdN layers and InGaGdN/GaN and InGaN/GaGdN superlattice (SL) structures were grown on (0001) sapphire substrates or MOVPE-grown GaN templates by plasma-assisted molecular beam epitaxy. Si co-doping into InGaGdN and GaN barrier layers of SL structures were also conducted. Non-existence of secondary phase and the Gd atom substitution of Ga sites were confirmed by X-ray diffraction and X-ray absorption fine structure measurements. Luminescence properties of InGaGdN were also observed at room temperature with the emission peak energy red-shifts corresponding to the InN molar fraction. Clear hysteresis and saturation were observed in the magnetization versus magnetic field (M-H) curves measured at room temperature for the InGaGdN single-layers and InGaGdN/GaN SLs. The magnetic properties of the Gd-doped InGaN are understood to be closely related to the carrier-mediated magnetism.
Keywords :
EXAFS; Hall effect; III-V semiconductors; X-ray diffraction; elemental semiconductors; ferromagnetic materials; gadolinium compounds; gallium compounds; indium compounds; magnetic epitaxial layers; magnetic hysteresis; magnetic multilayers; molecular beam epitaxial growth; photoluminescence; plasma materials processing; red shift; semiconductor doping; semiconductor epitaxial layers; semiconductor growth; semiconductor superlattices; semimagnetic semiconductors; silicon; wide band gap semiconductors; (0001) sapphire substrates; Al2O3; GaN barrier layers; Hall-effects; InGaGdN-GaN:Si; InGaN-GaGdN:Si; MOVPE; Si codoping; X-ray absorption fine structure measurements; X-ray diffraction; carrier-mediated ferromagnetism; emission peak energy red-shifts; epitaxial layers; hysteresis; luminescence properties; magnetic field curves; magnetic properties; molar fraction; plasma-assisted molecular beam epitaxy; saturation magnetization; secondary phase; superlattice structures; temperature 293 K to 298 K; Gallium nitride; Magnetic field measurement; Magnetic hysteresis; Magnetization; Saturation magnetization; Silicon; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
Print_ISBN :
978-1-4577-1753-6
Electronic_ISBN :
978-3-8007-3356-9
Type :
conf
Filename :
5978289
Link To Document :
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