• DocumentCode
    3592906
  • Title

    Six sigma: Systematic approach in probe damage reduction

  • Author

    Placido, Glenn T. ; Olalia, Carl ; Alolod, Rhal

  • Author_Institution
    ON Semicond. Philippines, ON Semicond., Carmona, Philippines
  • fYear
    2014
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    This paper describes how probe damage, the major defect at sort process, was toppled down nearly to ground level using the systematic approach of Six Sigma. A thorough study on the characteristic of the probe damage was made. Using root cause analysis tools, such as process mapping, cause and effect matrix, significance testing, and other useful quality tools, the sources of probe damage were identified, validated and solutions were developed. The PPM level of probe damage was significantly reduced resulting to less wafer scrappage, high yield and improvement on sort process efficiency.
  • Keywords
    cause-effect analysis; matrix algebra; semiconductor device reliability; semiconductor technology; six sigma (quality); PPM level; cause and effect matrix; probe damage reduction; process mapping; root cause analysis; significance testing; six sigma; wafer scrappage; Cleaning; Fasteners; Inspection; Loading; Needles; Probes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Manufacturing Technology Conference (IEMT), 2014 IEEE 36th International
  • Type

    conf

  • DOI
    10.1109/IEMT.2014.7123114
  • Filename
    7123114