DocumentCode
3592906
Title
Six sigma: Systematic approach in probe damage reduction
Author
Placido, Glenn T. ; Olalia, Carl ; Alolod, Rhal
Author_Institution
ON Semicond. Philippines, ON Semicond., Carmona, Philippines
fYear
2014
Firstpage
1
Lastpage
6
Abstract
This paper describes how probe damage, the major defect at sort process, was toppled down nearly to ground level using the systematic approach of Six Sigma. A thorough study on the characteristic of the probe damage was made. Using root cause analysis tools, such as process mapping, cause and effect matrix, significance testing, and other useful quality tools, the sources of probe damage were identified, validated and solutions were developed. The PPM level of probe damage was significantly reduced resulting to less wafer scrappage, high yield and improvement on sort process efficiency.
Keywords
cause-effect analysis; matrix algebra; semiconductor device reliability; semiconductor technology; six sigma (quality); PPM level; cause and effect matrix; probe damage reduction; process mapping; root cause analysis; significance testing; six sigma; wafer scrappage; Cleaning; Fasteners; Inspection; Loading; Needles; Probes;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Manufacturing Technology Conference (IEMT), 2014 IEEE 36th International
Type
conf
DOI
10.1109/IEMT.2014.7123114
Filename
7123114
Link To Document