Title :
Non-lithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays
Author :
Chern, W. ; Hsu, K. ; Chun, I. ; Azeredo, B. ; Fang, N. ; Ferreira, P. ; Li, X.
Author_Institution :
Center for Nanoscale Chem.-Electr.-Mech. Manuf. Syst., Univ. of Illinois, Urbana, IA, USA
Abstract :
We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion.
Keywords :
Batteries; Chemical engineering; Computer aided manufacturing; Etching; Optical arrays; Photovoltaic cells; Semiconductor device manufacture; Semiconductor nanostructures; Silicon; Surface morphology;
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
