DocumentCode :
3596587
Title :
Low temperature Cu-Cu thermocompression bonding assisted by electrochemical desorption of a self-assembled monolayer
Author :
Ghosh, Tamal ; Krishna, V. Siva Rama ; Singh, Shiv Govind
Author_Institution :
Dept. of Electr. Eng., IIT Hyderabad, Yeddumailaram, India
fYear :
2014
Firstpage :
1
Lastpage :
4
Abstract :
This paper reports low temperature Cu-Cu thermocompression bonding with the help of self-assembled monolayer (SAM) desorption. SAM layer protects copper from oxidation. It should be desorbed just before bonding. The desorption was carried out using cyclic voltammetry in aqueous potassium hydroxide (KOH) solution. Contact angle measurements carried out before and after desorption indicates successful desorption of SAM. The bonding was carried out at 150 °C and has yielded in excellent bond strength of 520 N.
Keywords :
copper; desorption; lead bonding; monolayers; oxidation; self-assembly; tape automated bonding; voltammetry (chemical analysis); KOH; SAM desorption; aqueous potassium hydroxide; contact angle measurement; cyclic voltammetry; electrochemical desorption; low temperature copper-copper thermocompression bonding; oxidation; self-assembled monolayer; temperature 150 C; Bonding; Copper; Films; Rough surfaces; Surface roughness; Surface treatment; Temperature measurement; Electrochemical desorption; Low temperature; SAM; Thermocompression bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Emerging Electronics (ICEE), 2014 IEEE 2nd International Conference on
Print_ISBN :
978-1-4673-6527-7
Type :
conf
DOI :
10.1109/ICEmElec.2014.7151165
Filename :
7151165
Link To Document :
بازگشت