A high-yield drying process for surface microstructures using active levitation

We present a novel technique for drying surface micromachined microstructures after their wet chemical etch/release. This technique has been proven especially effective in release/drying devices with large surface contact areas (e.g. larger than 1×1 mm²). Here, magnetic force is used to actively levitate (deflect) released micro structures out of the substrate plane during the drying process, thereby preventing stiction and obtaining a high yield (100%). Without the active levitation, fewer than 10% microstructures are freed