DocumentCode :
3598769
Title :
Study of Al nano-particles affect on AZO/Al/AZO tri-layer thin film
Author :
Tseng, Wei-Chih ; Chen, Kun-Cheng ; Huang, Yung-Hao ; Lin, Yen-Sheng ; Chen, Po-Wei ; Liu, Shih-Kun
Author_Institution :
Dept. of Electron. Eng., I-Shou Univ., Kaohsiung, Taiwan
fYear :
2011
Firstpage :
727
Lastpage :
728
Abstract :
In this paper, the designed growth of the multilayer electrodes as Al/AZO, AZO/Al/AZO and AZO/Al had been studied, which had been deposited on the glass substrates at room temperature by the radio frequency (RF) magnetron sputtering. The transmittance and the resistivity of AZO/Al/AZO thin film is much better than other thin films.
Keywords :
II-VI semiconductors; aluminium; electrical resistivity; multilayers; nanofabrication; nanoparticles; semiconductor growth; semiconductor thin films; sputter deposition; visible spectra; wide band gap semiconductors; zinc compounds; SiO2; ZnO:Al-Al-ZnO:Al; electrical properties; electrical resistivity; glass substrates; microstructure; multilayer electrodes; nanoparticles; optical properties; optical transmittance; radio frequency magnetron sputtering; temperature 293 K to 298 K; thin film; visible spectra; Aluminum; Artificial intelligence; Atmospheric measurements; Electric variables measurement; Magnetic films; Magnetic resonance imaging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2011 16th
Print_ISBN :
978-1-61284-288-2
Electronic_ISBN :
978-986-02-8974-9
Type :
conf
Filename :
6015345
Link To Document :
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