DocumentCode :
3600445
Title :
Improved structures for power MOSFETs with on-chip full protection
Author :
Zambrano, R.
Author_Institution :
Co.Ri.M.Me. Res. Center, SGS-Thomson Microelectronics, Catania, Italy
fYear :
1993
Firstpage :
1
Abstract :
Power MOSFETs with built-in shorted load protection have been recently presented where a lateral npn transistor pulls down the gate to limit the drain current, but a parasitic vertical npn can limit the operating voltage below the power MOSFET´s BVDSS. Further structural modifications so far devised result in large power losses or strongly non-linear characteristics. Such drawbacks have been overcome by a new LNPN structure, or by an NMOSFET, whose performance are optimized with a dedicated implant. The devices with bipolar-based feedback network exhibit better limiting behaviour, but similar performance can be achieved by increasing the sense ratio in the NMOSFET-based devices. All the devices feature ESD protection and an active gate-drain clamp to enhance ruggedness. The clamping voltage is set below the power MOSFET´s BVDSS, is independent of the epilayer parameters, and has a low temperature coefficient, thus resulting in very predictable performance
Keywords :
electrostatic discharge; insulated gate field effect transistors; ion implantation; power transistors; protection; ESD protection; LNPN structure; NMOSFET; active gate-drain clamp; bipolar-based feedback network; built-in shorted load protection; clamping voltage; dedicated implant; low temperature coefficient; on-chip full protection; power MOSFETs; sense ratio;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Power Electronics and Applications, 1993., Fifth European Conference on
Type :
conf
Filename :
265020
Link To Document :
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