Title :
Generalized Predictive Control of Temperature on an Atomic Layer Deposition Reactor
Author :
Wen-Jie He ; Hai-Tao Zhang ; Zhiyong Chen ; Bo Chu ; Kun Cao ; Bin Shan ; Rong Chen
Author_Institution :
State Key Lab. of Digital Manuf. Equip. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
This brief establishes a closed-loop control system for a radiant heating atomic layer deposition (ALD) reactor using generalized predictive control (GPC). The GPC-based closed-loop control system can rapidly and precisely stabilize the temperature in the presence of external disturbances. Compared with the conventional open-loop control and the proportional-integral-differential control, the closed-loop GPC system enhances the processing efficiency between every ALD run by substantially reducing settling time with impact by external disturbances. The attenuated temperature fluctuation leads to more uniform thin-film morphologies that fulfill the technical requirements of ALD processes.
Keywords :
PI control; atomic layer deposition; closed loop systems; heat radiation; predictive control; temperature control; GPC-based closed-loop control system; generalized predictive control; open-loop control; proportional-integral-differential control; radiant heating ALD reactor; radiant heating atomic layer deposition reactor; temperature control; thin-film morphologies; Atomic layer deposition; Predictive control; Temperature control; Thin films; Atomic layer deposition (ALD); external disturbance; nanometer thin film; predictive control; temperature control; temperature control.;
Journal_Title :
Control Systems Technology, IEEE Transactions on
DOI :
10.1109/TCST.2015.2404898
