Title :
Effects of Annealing Temperature on Magnetic Properties of Co Thin Films on Si (100)
Author :
Kai Wang ; Yue Zhao ; Guojian Li ; Chun Wu ; Qiang Wang ; Jicheng He
Author_Institution :
Key Lab. of Electromagn. Process. of Mater., Northeastern Univ., Shenyang, China
Abstract :
The effects of silicide formation on the surface structure and magnetic properties of Co thin films on Si (100) were investigated. Annealing temperature significantly changed the formation of silicide. CoSi phase was formed during annealing at 600 °C and 700 °C. CoSi2 phase was formed during annealing at 800 °C. The anisotropy of Co/Si (100) films changed due to the formation of silicide. In addition, both the particle size and the surface roughness increased with the increase of annealing temperature, which led to the increase of coercivity up to 700 °C. However, the better crystallinity HC decreased at 800 °C.
Keywords :
annealing; cobalt; coercive force; magnetic anisotropy; magnetic thin films; metallic thin films; particle size; surface roughness; Co; Co thin films; Si; Si (100); annealing temperature; coercivity; crystallinity; magnetic anisotropy; magnetic properties; particle size; silicide formation; surface roughness; surface structure; temperature 600 degC; temperature 700 degC; temperature 800 degC; Annealing; Films; Magnetic properties; Silicides; Silicon; Substrates; Surface morphology; Co Silicide; Co silicide; Magnetic properties; Surface structure; Thin films; magnetic properties; surface structure; thin films;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2015.2427296
