DocumentCode
3602638
Title
A Monolithic High-Flow Knudsen Pump Using Vertical Al2O3 Channels in SOI
Author
Seungdo An ; Yutao Qin ; Gianchandani, Yogesh B.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Univ. of Michigan, Ann Arbor, MI, USA
Volume
24
Issue
5
fYear
2015
Firstpage
1606
Lastpage
1615
Abstract
This paper describes the analysis, design, and microfabrication of a Knudsen pump for high flow generation. The Knudsen pump generates gas streams from the cold end to the hot end using free-molecular flow without moving parts. The designed Knudsen pump has densely arrayed vertically oriented 2-μm wide rectangular channels for providing high flow. The temperature gradient is provided between a thin-film metal heater and a gridded Si heat sink in the Knudsen pump structure. The Knudsen pump is fabricated on a single silicon-on-insulator wafer using a four-mask lithographic process. The sidewalls of the rectangular channels are constructed by atomic layer deposition of Al2O3 on sacrificial Si channels and subsequent Si etching. The fabricated Knudsen pumps have designed footprints ranging from 0.4-3.2 cm2. At atmospheric pressure, the fabricated Knudsen pumps provide a maximum measured air flow rate of >200 sccm with response time of <;0.5 s. Experimental results have also shown that these Knudsen pumps are most suitable for pumping at moderate vacuum pressure of ≈200 Torr (27 kPa).
Keywords
Knudsen flow; alumina; atomic layer deposition; etching; heat sinks; heat transfer; lithography; microchannel flow; microfabrication; micropumps; silicon; silicon-on-insulator; thin film devices; Al2O3; Knudsen pump structure; SOI; Si; air flow rate; atmospheric pressure; atomic layer deposition; four-mask lithographic process; free-molecular flow; gas streams; gridded Si heat sink; high flow generation; monolithic high-flow Knudsen pump; pressure 1 atm; pressure 27 kPa; rectangular channels; response time; sacrificial Si channels; single silicon-on-insulator wafer; size 2 mum; subsequent Si etching; temperature gradient; thin-film metal heater; vacuum pressure; vertical alumina channels; Aluminum oxide; Dielectrics; Etching; Heat pumps; Heat sinks; Silicon; Temperature distribution; Thermal transpiration; chromatography; chromatography.; gas; vacuum;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2015.2426699
Filename
7115024
Link To Document