• DocumentCode
    3602871
  • Title

    Preparation of Low Microwave Loss YIG Thin Films by Pulsed Laser Deposition

  • Author

    Bhoi, B. ; Sahu, B. ; Venkataramani, N. ; Aiyar, R.P.R.C. ; Prasad, Shiva

  • Author_Institution
    Centre for Res. in Nanotechnol. & Sci., Indian Inst. of Technol. Bombay, Mumbai, India
  • Volume
    51
  • Issue
    11
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Y3Fe5O12 thin films with thickness 10 nm ≤ t ≤ 1440 nm were grown on Gd3Ga5O12 (111) substrates by pulsed laser deposition. The X-ray diffraction experiments confirmed the films are pure yttrium iron garnet (YIG) phase with preferred (111) orientation. The magnetic and microwave properties were studied as a function of film thickness by the dc magnetization and ferromagnetic resonance (FMR) measurements. The FMR linewidth (ΔH) was found to decrease with the increase in film thickness (10 nm ≤ t ≤ 45 nm), attaining a minimum value of ΔH = 5 Oe and ΔH|| = 6 Oe, for perpendicular and parallel resonance, and then rising with further increase in thickness. Acid etching experiments were performed to understand the mechanism contributing to ΔH. The increase in ΔH with thickness (t > 45 nm) may be explained in terms of extrinsic mechanisms, such as inhomogeneities present at the surface of the films. However, the decrease in ΔH with thickness (t <; 45 nm) is believed to be due to the surface anisotropy effect. The films showed low coercivity values in the range of ~1.5-7 Oe, which is an indicator of good quality YIG films.
  • Keywords
    EPR line breadth; X-ray diffraction; coercive force; eddy current losses; etching; ferromagnetic resonance; garnets; magnetic anisotropy; magnetic epitaxial layers; magnetic leakage; pulsed laser deposition; surface magnetism; surface texture; vapour phase epitaxial growth; yttrium compounds; FMR linewidth; Gd3Ga5O12; Gd3Ga5O12 (111) substrates; X-ray diffraction; YIG; acid etching; coercivity; dc magnetization; electron spin resonance spectroscopy; extrinsic mechanisms; ferromagnetic resonance; film thickness; low-microwave loss thin films; magnetic properties; microwave properties; parallel resonance; perpendicular resonance; preferred (111) orientation; pulsed laser deposition; surface anisotropy effect; yttrium iron garnet phase; Etching; Films; Magnetic resonance; Masers; Pulsed laser deposition; Substrates; Ferromagnetic Resonance; Ferromagnetic resonance (FMR); linewidth; microwave;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2015.2434850
  • Filename
    7118729