Title :
Electric-Field-Controlled Magnetoelectric RAM: Progress, Challenges, and Scaling
Author :
Khalili Amiri, Pedram ; Alzate, Juan G. ; Cai, Xue Qing ; Ebrahimi, Farbod ; Hu, Qi ; Wong, Kin ; Grezes, Cecile ; Lee, Hochul ; Yu, Guoqiang ; Li, Xiang ; Akyol, Mustafa ; Shao, Qiming ; Katine, Jordan A. ; Langer, Jurgen ; Ocker, Berthold ; Wang, Kang L
Author_Institution :
Dept. of Electr. Eng., Univ. of California at Los Angeles, Los Angeles, CA, USA
Abstract :
We review the recent progress in the development of magnetoelectric RAM (MeRAM) based on electric-field-controlled writing in magnetic tunnel junctions (MTJs). MeRAM uses the tunneling magnetoresistance effect for readout in a two-terminal memory element, similar to other types of magnetic RAM. However, the writing of information is performed by voltage control of magnetic anisotropy (VCMA) at the interface of an MgO tunnel barrier and the CoFeB-based free layer, as opposed to current-controlled (e.g., spin-transfer torque or spin-orbit torque) mechanisms. We present results on voltage-induced switching of MTJs in both resonant (precessional) and thermally activated regimes, which demonstrate fast (<;1 ns) and ultralow-power (<;40 fJ/bit) write operations at voltages ~1.5-2 V. We also discuss the implications of the VCMA-based write mechanism on memory array design, highlighting the possibility of crossbar implementation for high bit density. Results are presented from a 1 kbit MeRAM test array. Endurance and voltage scaling data are presented. The scaling behavior is analyzed, and material-level requirements are discussed for the translation of MeRAM into mainstream memory applications.
Keywords :
MRAM devices; cobalt compounds; iron compounds; magnesium compounds; magnetic anisotropy; magnetic tunnelling; magnetoresistance; voltage control; CoFeB; CoFeB-based free layer; MTJ; MeRAM test array; MgO; MgO tunnel barrier; VCMA-based write mechanism; crossbar implementation; electric-field-controlled writing; endurance data; magnetic anisotropy; magnetic tunnel junctions; magnetoelectric RAM; mainstream memory applications; material-level requirements; memory array design; spin-orbit torque mechanisms; spin-transfer torque mechanisms; tunneling magnetoresistance effect; two-terminal memory element; voltage 1.5 V to 2 V; voltage control; voltage scaling data; voltage-induced switching; Arrays; Electric fields; Magnetic tunneling; Perpendicular magnetic anisotropy; Switches; Thermal stability; MRAM; Magnetic RAM (MRAM); MeRAM; Nonvolatile memory; magnetoelectric RAM (MeRAM); nonvolatile memory; spin transfer torque; spin-transfer torque (STT); voltage control of magnetic anisotropy; voltage control of magnetic anisotropy (VCMA);
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2015.2443124