Title :
New Interference Technique for Determination of Low Loss Material Permittivity in the Extremely High Frequency Range
Author :
Andrushchak, Nazariy A. ; Karbovnyk, Ivan D. ; Godziszewski, Konrad ; Yashchyshyn, Yevhen ; Lobur, Mykhailo V. ; Andrushchak, Anatoliy S.
Author_Institution :
Lviv Polytech. Nat. Univ., Lviv, Ukraine
Abstract :
In this paper a new interference technique for material permittivity determination in the extremely high frequency range using a vector network analyzer is described. The novelty of this technique is the absence of a reference interference channel and there is no need to rotate the experimental sample that simplifies the measurement process and increases its accuracy. In order to approve this technique, the respective experimental setup was designed. The setup structure and theoretical background of interference fringe minimum formation were described. Based on the quasi-optical principle of the setup operation, the formula for the calculation of the material permittivity was derived. Two different dielectric materials were subjected to test measurements using the created experimental setup. Obtained average values of permittivity in the 50÷70 GHz range are ε = 10.67 ± 0.09 and ε = 2.35 ± 0.03 for sapphire and optical glass, respectively. For the purposes of result verification, the time-domain processing technique was also applied to calculate the permittivity of these materials. Besides, the obtained data are compared with those reported in the literature.
Keywords :
dielectric materials; network analysers; permittivity measurement; time-domain analysis; dielectric materials; extremely high frequency range; interference technique; material permittivity determination; time-domain processing technique; vector network analyzer; Accuracy; Electromagnetic radiation; Frequency measurement; Interference; Lenses; Permittivity; Permittivity measurement; EHF range; Interference technique; Vector Network Analyzer.; material permittivity; vector Network Analyzer;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
DOI :
10.1109/TIM.2015.2437631