Modeling of a Vortex Water-Wall Argon Arc Lamp for Rapid Thermal Annealing Applications

Author

Grover, Harpreet Singh ; Dawson, Francis P. ; Camm, David M. ; Cressault, Yann ; Lieberer, Markus

Author_Institution

Univ. of Toronto, Toronto, ON, Canada

Volume

51

Issue

6

fYear

2015

Firstpage

4817

Lastpage

4823

Abstract

This paper describes a modeling approach for a vortex water-wall argon arc lamp that is amenable to implementation in real-time controller hardware. The net emission coefficient (NEC) method has been successfully applied for different current levels and can predict the electrical properties of the positive column to sufficient accuracy. The radiation efficiency as a function of the isothermal core temperature has been explained qualitatively, but the correction for radiation efficiency as a function of input power has been implemented as a lookup table using experimental data.

Keywords

incoherent light annealing; modelling; rapid thermal annealing; semiconductor industry; semiconductor technology; vortices; NEC method; isothermal core temperature; net emission coefficient method; rapid thermal annealing application; semiconductor wafer; vortex water-wall argon arc lamp modelling; Argon; Electron tubes; Isothermal processes; Mathematical model; Plasma temperature; Semiconductor device modeling; Lamp modeling; lamp modeling; semiconductor annealing; thermal modeling of wafer; vortex stabilized lamp; vortex-stabilized lamp;

fLanguage

English

Journal_Title

Industry Applications, IEEE Transactions on

Publisher

ieee

ISSN

0093-9994

Type

jour

DOI

10.1109/TIA.2015.2451099

Filename

7145442