Title :
Investigation of a Vacuum Encapsulated Si-to-Si Contact Microswitch Operated From −60 °C to 400 °C
Author :
Bo Woon Soon ; You Qian ; Ng, Eldwin J. ; Hong, Vu A. ; Yushi Yang ; Chae Hyuck Ahn ; Kenny, Thomas W. ; Chengkuo Lee
Author_Institution :
Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore, Singapore
Abstract :
We report on characterization of Si-to-Si contact microswitches fabricated in an ultraclean encapsulation process. This three-terminal microswitch relies on a curved beam (source) that actuates toward the contact terminal (drain) by charging the control terminal (gate). The operation range of this switch from -60 °C to 300 °C is investigated, which approximately yields a resistance drift of -200 Ω/K. Our experiments include tests of the high-temperature lifetime during continuous ON-OFF cycles. By reducing Joule heating at the contact, preliminary results demonstrate at least 106 cycles longer lifetime at 400 °C. Subsequently, the failure mode is investigated and reported. The study of ultraclean Si-to-Si contact-based microswitches provides a crucial guideline to the field of mechanical and electrical failure mechanisms for harsh environment applications.
Keywords :
electrical contacts; elemental semiconductors; encapsulation; failure analysis; microfabrication; microswitches; silicon; Joule heating; Si-Si; contact terminal; curved beam; electrical failure mechanism; mechanical failure mechanism; temperature -60 degC to 400 degC; three-terminal microswitch; ultraclean encapsulation process; vacuum encapsulated Si-to-Si contact microswitch; Contact resistance; Logic gates; Microswitches; Silicon; Temperature measurement; Reliability; electrostatic switch; relay; rugged electronics; switch; switch.;
Journal_Title :
Microelectromechanical Systems, Journal of
DOI :
10.1109/JMEMS.2015.2451191