Title :
High Curvature Concave–Convex Microlens
Author :
Jun-Jie Xu ; Wen-Gang Yao ; Zhen-Nan Tian ; Lei Wang ; Kai-Min Guan ; Ying Xu ; Qi-Dai Chen ; Ji-An Duan ; Hong-Bo Sun
Author_Institution :
State Key Lab. on Integrated Optoelectron., Jilin Univ., Changchun, China
Abstract :
We report in this letter a concave-convex microlens (CCML) consisting of two different high curvature surfaces. Compared with the conventional plano-convex microlenses, the CCML not only allows for more design freedom, but also offers significantly improved optical performance, particularly minimization of aberration, as is critical when the size of optical components is small. Experimentally, focusing capability at different wavelengths was demonstrated, and the axial chromatic aberration was found significantly reduced to ~4.6 % of the focal length shift under wavelength 450-660 nm.
Keywords :
aberrations; microlenses; optical design techniques; optical focusing; CCML; axial chromatic aberration; conventional plano-convex microlenses; design freedom; focal length shift; focusing capability; high curvature concave-convex microlens; optical components; optical performance; wavelength 450 nm to 660 nm; Lenses; Microoptics; Optical imaging; Optical surface waves; Sun; Ultrafast optics; Concave-convex microlens; design freedom; femtosecond laser direct writing; high curvature;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2015.2470195
