DocumentCode
3605551
Title
Write-Once-Read-Many-Times and Bipolar Resistive Switching Characteristics of TiN/HfO2/Pt Devices Dependent on the Electroforming Polarity
Author
Yan Li ; Xuexue Pan ; Yong Zhang ; Xinman Chen
Author_Institution
Inst. of Optoelectron. Mater. & Technol., South China Normal Univ., Guangzhou, China
Volume
36
Issue
11
fYear
2015
Firstpage
1149
Lastpage
1152
Abstract
In this letter, we report the dependence of memory characteristics on electroforming polarity based on TiN/HfO2/Pt devices. Bipolar resistive switching (BRS) and write-once-read-many-times memory (WORM) behaviors were obtained after the negative and positive electroforming process, respectively. Analysis of conduction mechanisms of high resistance state confirms that BRS and WORM were dominated by Schottky emission and trap-controlled space charge limited current, respectively. These phenomena can be explained by the filamentary model with the assistance of interfacial role. Moreover, this letter also indicates that the TiN/HfO2/Pt devices have promising application in both RRAM and non-editable WORM.
Keywords
electroforming; hafnium compounds; platinum; resistive RAM; space charge; titanium compounds; write-once storage; BRS; RRAM; Schottky emission; TiN-HfO2-Pt; WORM; bipolar resistive switching characteristic; electroforming polarity; electroforming process; trap-controlled space charge limited current; write-once-read-many-time memory; Electrodes; Grippers; Hafnium compounds; Resistance; Switches; Threshold voltage; Tin; HfO2; Resistive switching; SCLC; Schottky emission; WORM; electroforming polarity;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2015.2477421
Filename
7247661
Link To Document