Influence of Sputtering Power on Static and Dynamic Magnetic Properties of FeCoN Films

Author

Yuping Wu ; Yong Yang ; Zhihong Yang ; Baoyu Zong

Author_Institution

Temasek Labs., Nat. Univ. of Singapore, Singapore, Singapore

Volume

6

fYear

2015

fDate

7/7/1905 12:00:00 AM

Firstpage

1

Lastpage

4

Abstract

A series of sputtered FeCoN thin films were deposited on Si (100) at different power levels. Films sputtered with 150 W of power exhibited almost in-plane isotropy accompanied with relatively high coercivity of about 50 Oe due to weak perpendicular anisotropy. When the deposition power was 250 W and above, a well-defined in-plane anisotropy emerged with an anisotropy field in the range of 41 to 109 Oe; the coervivity was significantly reduced to a few oersteds. Dynamic magnetic properties were measured with the shorted microstrip transmission-line perturbation method. Controllable and high microwave permeability was obtained for films deposited under high sputtering power. The differences in soft magnetic properties and magnetization dynamics originate from the changes in film composition and residual stress.

Keywords

cobalt compounds; coercive force; internal stresses; iron compounds; magnetic thin films; perpendicular magnetic anisotropy; sputter deposition; FeCoN; coercivity; deposition power; dynamic magnetic properties; in-plane isotropy; magnetization dynamics; microwave permeability; perpendicular anisotropy; power 150 W; power 250 W; residual stress; shorted microstrip transmission line perturbation method; sputtered thin films; sputtering power; static magnetic properties; Anisotropic magnetoresistance; Coercive force; Films; Magnetic properties; Magnetization; Permeability; Sputtering; Soft magnetic materials; electromagnetics; microwave magnetics;

fLanguage

English

Journal_Title

Magnetics Letters, IEEE

Publisher

ieee

ISSN

1949-307X

Type

jour

DOI

10.1109/LMAG.2015.2484279

Filename

7286767