DocumentCode :
3607644
Title :
High mobility transparent flexible nickel-doped zinc oxide thin-film transistors with small subthreshold swing
Author :
Lingling Huang ; Dedong Han ; Yi Zhang ; Pan Shi ; Wen Yu ; Guodong Cui ; Yingying Cong ; Junchen Dong ; Shengdong Zhang ; Xing Zhang ; Yi Wang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Volume :
51
Issue :
20
fYear :
2015
Firstpage :
1595
Lastpage :
1596
Abstract :
High-mobility nickel (Ni)-doped zinc oxide thin-film transistors (NZO TFTs) have been successfully fabricated on flexible transparent plastic substrates at a low temperature. The devices all exhibited good electrical properties with small subthreshold swing (SS) and high saturation mobility fabricated under different sputtering pressure (0.4, 0.8, 1.2, 1.6 Pa) during channel deposition by RF magnetron sputtering were found. The electrical properties of NZO TFTs reached the best when the sputtering pressure was 1.6 Pa, with an SS of 89 mV/decade, a saturation mobility of 172 cm2·V-1·s-1, a drain current on/off ratio of 108, and a positive threshold voltage of 2.36 V. The results show that Ni-doped ZnO is a promising candidate for flexible fully transparent displays.
Keywords :
flexible displays; high electron mobility transistors; nickel; plastics; semiconductor doping; sputtering; substrates; thin film transistors; zinc compounds; NZO TFT; RF magnetron sputtering; SS; ZnO:Ni; channel deposition; drain current; electrical property; flexible fully transparent display; flexible transparent plastic substrate; high mobility transparent flexible nickel doped zinc oxide thin-film transistor; positive threshold voltage; pressure 0.4 Pa; pressure 0.8 Pa; pressure 1.2 Pa; pressure 1.6 Pa; saturation mobility; small subthreshold swing; sputtering pressure; voltage 2.36 V;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2015.2041
Filename :
7289495
Link To Document :
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