DocumentCode :
3609275
Title :
Surface-Controlled Metal Oxide Resistive Memory
Author :
Jr-Jian Ke ; Namura, Kyoko ; Retamal, Jose R. D. ; Chih-Hsiang Ho ; Minamitake, Haruhiko ; Tzu-Chiao Wei ; Dung-Sheng Tsai ; Chun-Ho Lin ; Suzuki, Motofumi ; Jr-Hau He
Author_Institution :
Comput., Electr. & Math. Sci. & Eng. Div., King Abdullah Univ. of Sci. & Technol., Thuwal, Saudi Arabia
Volume :
36
Issue :
12
fYear :
2015
Firstpage :
1307
Lastpage :
1309
Abstract :
To explore the surface effect on resistive random-access memory (ReRAM), the impact of surface roughness on the characteristics of ZnO ReRAM was studied. The thickness-independent resistance and the higher switching probability of ZnO ReRAM with rough surfaces indicate the importance of surface oxygen chemisorption on the switching process. Furthermore, the improvements in switching probability, switching voltage, and resistance distribution observed for ReRAM with rough surfaces can be attributed to the stable oxygen adatoms under various ambience conditions. The findings validate the surface-controlled stability and the uniformity of ReRAM and can serve as the guideline for developing practical device applications.
Keywords :
II-VI semiconductors; chemisorption; resistive RAM; surface roughness; wide band gap semiconductors; zinc compounds; ZnO; ZnO ReRAM; resistance distribution; resistive random-access memory; stable oxygen adatoms; surface effect; surface oxygen chemisorption; surface roughness; surface-controlled metal oxide resistive memory; surface-controlled stability; switching probability; switching voltage; thickness-independent resistance; Random access memory; Rough surfaces; Surface roughness; Zinc oxide; ZnO; oxygen chemisorption; resistive random-access memory; surface roughness;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2015.2493343
Filename :
7310859
Link To Document :
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