• DocumentCode
    3610138
  • Title

    2 ps resolution, fine-grained delay element in 28 nm FDSOI

  • Author

    Hua, W. ; Tadros, R.N. ; Beerel, P.

  • Author_Institution
    Ming Hsieh Dept. of Electr. Eng., Univ. of Southern California, Los Angeles, CA, USA
  • Volume
    51
  • Issue
    23
  • fYear
    2015
  • Firstpage
    1848
  • Lastpage
    1850
  • Abstract
    A novel diversely body-biased current-starved delay element (DE) architecture for fine-grained DEs is presented. Using fully depleted silicon-on-insulator back-body biasing, it achieves a resolution of 2 ps with a delay quantisation error of 7.1%. Compared with the state-of-the-art DEs, it exhibits the least leakage current and efficient overall energy consumption and is the most robust to process variations.
  • Keywords
    energy consumption; leakage currents; silicon-on-insulator; FDSOI; delay quantisation error; diversely body-biased current-starved delay element; energy consumption; fine-grained DE; fine-grained delay element; fully depleted silicon-on-insulator back-body biasing; leakage current; size 28 nm;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2015.2667
  • Filename
    7323947