Impact of Metallization Layer Structure on the Performance of G-Band Branch-Line Couplers

Author

Amado-Rey, B. ; Campos-Roca, Y. ; Weber, R. ; Maroldt, S. ; Tessmann, A. ; Massler, H. ; Wagner, S. ; Leuther, A. ; Ambacher, O.

Author_Institution

IAF, Fraunhofer Inst. for Appl. Solid State Phys., Freiburg, Germany

Volume

25

Issue

12

fYear

2015

Firstpage

793

Lastpage

795

Abstract

Five different versions of grounded coplanar waveguide (GCPW) branch-line couplers on GaAs were EM simulated, processed and investigated for operation in G-band (140-220 GHz), based on different layer structures (including 2 or 3 metallization layers) and layouts. The best results have been obtained with the structures based on a continuous galvanic metal in the central conductor line and ohmic connections between top ground planes, reducing the insertion losses by 0.8 dB. A measured amplitude imbalance less than 0.5 dB from 160 to 200 GHz (22%), with a coupler insertion loss lower than 1.3 dB was achieved for a 3 metallization layer branch-line coupler.

Keywords

coplanar waveguides; electromagnetic waves; metallisation; waveguide couplers; EM simulated; G-band branch line couplers; GCPW; GaAs; bandwidth 140 GHz to 220 GHz; conductor line; galvanic metal; grounded coplanar waveguide; insertion losses; metallization layer structure; Coplanar waveguides; Couplers; Insertion loss; Loss measurement; Metallization; Millimeter wave circuits; Transmission line measurements; Branch-line; electromagnetic (EM) simulation; grounded coplanar waveguide (GCPW); hybrid; millimeter-wave;

fLanguage

English

Journal_Title

Microwave and Wireless Components Letters, IEEE

Publisher

ieee

ISSN

1531-1309

Type

jour

DOI

10.1109/LMWC.2015.2496778

Filename

7332254