• DocumentCode
    3611419
  • Title

    Electrical design of through silicon via (lee, m., et al; 2014) [book review]

  • Author

    Orlandi, Antonio

  • Volume
    4
  • Issue
    3
  • fYear
    2015
  • Firstpage
    33
  • Lastpage
    33
  • Abstract
    This is a very interesting and well written book on a hot topic nowadays in signal and power integrity: the study of three dimensional integrated circuits (3D IC) with particular emphasis on the analysis and design of Through Silicon Vias (TSV). TSV, in very basic terms, is a metal pillar inside the silicon (Si) wafer with a silicon oxide coating (???liner???) to block the DC leakage current between the metal pillar and the silicon wafer.
  • Keywords
    Book reviews; Coatings; Integrated circuits; Silicon; Three-dimensional displays; Through-silicon vias;
  • fLanguage
    English
  • Journal_Title
    Electromagnetic Compatibility Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    2162-2264
  • Type

    jour

  • DOI
    10.1109/MEMC.2015.7336692
  • Filename
    7336692