DocumentCode :
3613395
Title :
Noise spectroscopy of semiconductor materials and devices
Author :
J. Sikula;L. Stourac
Author_Institution :
Czech Noise Res. Lab., Brno Univ. of Technol., Czech Republic
Volume :
2
fYear :
2002
fDate :
6/24/1905 12:00:00 AM
Firstpage :
767
Abstract :
The noise spectroscopy in time and frequency domain is used to give information on single carrier trapping and charge carrier transport in MOSFETs, quantum dots, conducting film resistors, capacitors and single crystals. Defects in the vicinity of the p-n junction and MOS channel create 1/f noise, burst noise or RTS noise. The sources of fluctuation are quantum transitions of carriers between localised states and energy bands, carrier number and mobility. Noise reliability indicators are used to assess the device quality and reliability.
Keywords :
"Semiconductor device noise","Spectroscopy","Semiconductor materials","Frequency domain analysis","Charge carriers","MOSFETs","Quantum dots","Conductive films","Semiconductor films","Resistors"
Publisher :
ieee
Conference_Titel :
Microelectronics, 2002. MIEL 2002. 23rd International Conference on
Print_ISBN :
0-7803-7235-2
Type :
conf
DOI :
10.1109/MIEL.2002.1003370
Filename :
1003370
Link To Document :
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