• DocumentCode
    3615508
  • Title

    Evaluation of the diffusion length in polycrystalline silicon by surface photovoltage technique

  • Author

    V. Svrcek;A. Focsa;A. Slaoui;J.C. Muller;I. Pelant

  • Author_Institution
    CNRS, Strasbourg, France
  • Volume
    2
  • fYear
    2003
  • fDate
    6/25/1905 12:00:00 AM
  • Firstpage
    1040
  • Abstract
    The Surface Photovoltage (SPV) technique in a expanded spectral region is applied to study perpendicular transport properties in fine (fg/spl sim/1-5 /spl mu/m) and large grained (lg/spl sim/1-3 mm) polycrystalline silicon (p-Si) thin layers made on foreign substrates. A mathematical approach to evaluate the minority carrier diffusion length in complete p-Si solar cells is proposed. This approach allows us to model experimental SPV data by adjusting just one fitting parameter, i.e. the diffusion length. The investigations are carried out on n/sup +/pp/sup +/ cell structures. A beneficial influence on the perpendicular carrier diffusion length is observed in the large grained pc-Si materials. The diffusion length improved more than 4 times from /spl sim/7 /spl mu/m for fg-Si to about /spl sim/34 /spl mu/m for lg-Si.
  • Keywords
    "Silicon","Photovoltaic cells","Substrates","Photovoltaic systems","Solar power generation","Plasma temperature","Semiconductor thin films","Plasma materials processing","Chemical vapor deposition","Plasma properties"
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1306090