DocumentCode :
3615508
Title :
Evaluation of the diffusion length in polycrystalline silicon by surface photovoltage technique
Author :
V. Svrcek;A. Focsa;A. Slaoui;J.C. Muller;I. Pelant
Author_Institution :
CNRS, Strasbourg, France
Volume :
2
fYear :
2003
fDate :
6/25/1905 12:00:00 AM
Firstpage :
1040
Abstract :
The Surface Photovoltage (SPV) technique in a expanded spectral region is applied to study perpendicular transport properties in fine (fg/spl sim/1-5 /spl mu/m) and large grained (lg/spl sim/1-3 mm) polycrystalline silicon (p-Si) thin layers made on foreign substrates. A mathematical approach to evaluate the minority carrier diffusion length in complete p-Si solar cells is proposed. This approach allows us to model experimental SPV data by adjusting just one fitting parameter, i.e. the diffusion length. The investigations are carried out on n/sup +/pp/sup +/ cell structures. A beneficial influence on the perpendicular carrier diffusion length is observed in the large grained pc-Si materials. The diffusion length improved more than 4 times from /spl sim/7 /spl mu/m for fg-Si to about /spl sim/34 /spl mu/m for lg-Si.
Keywords :
"Silicon","Photovoltaic cells","Substrates","Photovoltaic systems","Solar power generation","Plasma temperature","Semiconductor thin films","Plasma materials processing","Chemical vapor deposition","Plasma properties"
Publisher :
ieee
Conference_Titel :
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Print_ISBN :
4-9901816-0-3
Type :
conf
Filename :
1306090
Link To Document :
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