3618391

Characterization of alternative gate dielectrics using electrical I-V and C-V measurements

K.Z. Ahmed

2004

6/26/1905 12:00:00 AM

196

196

"Capacitance-voltage characteristics","Dielectric measurements","Electric variables measurement","High K dielectric materials","Materials reliability","High-K gate dielectrics","Dielectric materials","Hafnium oxide","Tunneling","Atomic layer deposition"

ieee

Integrated Reliability Workshop Final Report, 2004 IEEE International

0-7803-8517-9

conf

10.1109/IRWS.2004.1422777

1422777