DocumentCode :
3618854
Title :
Real structure of sputtered yttrium oxide films with different oxygen content
Author :
P. Sutta;I. Novotny;L. Harmatha
fYear :
2004
fDate :
6/26/1905 12:00:00 AM
Firstpage :
61
Lastpage :
64
Keywords :
"Oxygen","Sputtering","Dielectric thin films","Substrates","X-ray scattering","Crystallization","Lattices","Optical films","Residual stresses"
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on
Print_ISBN :
0-7803-8335-7
Type :
conf
DOI :
10.1109/ASDAM.2004.1441158
Filename :
1441158
Link To Document :
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