• DocumentCode
    3619518
  • Title

    Optimisation of a Pre-Metal-Dielectric with a contact etch stop layer for 0.18um and 0.13um technologies

  • Author

    B. De Jaeger;G. Van den bosch;M. Van Hove;I. Debusschere;M. Schaekers;G. Badenes

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    2000
  • fDate
    6/22/1905 12:00:00 AM
  • Firstpage
    260
  • Lastpage
    263
  • Keywords
    "Etching","Silicon","Hot carriers","Plasma temperature","Plasma applications","Plasma devices","Contamination","Silicides","Degradation","Stress"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2000. Proceeding of the 30th European
  • Print_ISBN
    2-86332-248-6
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2000.194764
  • Filename
    1503694
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619518