Plasma Damage Impact in 0.25 um Dual-Gate Technology

Author

G. Ghidini;F. Pellizzer;N. Galbiati;D. Brazzelli;D. Peschiaroli;L. Brusaferri

Author_Institution

STMicroelectronics, Agrate Brianza, Italy

fYear

2000

fDate

6/22/1905 12:00:00 AM

Firstpage

276

Lastpage

279

Keywords

"Plasmas","Implants","Degradation","Annealing","Electric breakdown","Conductivity","Stress","Capacitors"

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2000. Proceeding of the 30th European

Print_ISBN

2-86332-248-6

Type

DOI

10.1109/ESSDERC.2000.194768

Filename

1503698

Link To Document